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Subsecond Annealing of Advanced Materials

SSMS: SUBSECOND ANNEALING OF ADVANCED MATERIALS

Engineering

Mathematics & Science

Gt Product Group

Binding Format

Marketing Imprint Name

B2B GT

CL Carton Count

Imprint Name

B2B & B2C

The thermal processing of materials ranges from few fem to seconds by Swift Heavy Ion Implantation to about one second using advanced Rapid Thermal Annealing. This book offers after an historical excursus selected contributions on fundamental and applied aspects of thermal processing of classical elemental semiconductors and other advanced materials including nanostructures with novel optoelectronic, magnetic, and superconducting properties. Special emphasis is given on the diffusion and segregation of impurity atoms during thermal treatment. A broad range of examples describes the solid phase and/or liquid phase processing of elemental and compound semiconductors, dielectric composites and organic materials.

POST SECONDARY FOUR YEAR

COLFR

COLJR

COLSO

COLSR

Duration

Duration Unit Of Measure

Transaction Type

Front Cover.
Half Title Page.
Other Frontmatter.
Title Page.
Copyright Page.
Preface.
Contents.
Contributors.
1: Historical Aspects of Subsecond Thermal Processing.
2: Nanonet Formation by Constitutional Supercooling of Pulsed Laser Annealed, Mn-Implanted Germanium.
3: Metastable Activation of Dopants by Solid Phase Epitaxial Recrystallisation.
4: Superconducting Gallium Implanted Germanium.
5: Structural Changes in SiGe/Si Layers Induced by Fast Crystallization.
6: Sub-nanosecond Thermal Spike Induced Nanostructuring of Thin Solid Films Under Swift Heavy Ion (SHI) Irradiation.
7: Pulsed-Laser-Induced Epitaxial Growth of Silicon for Three-Dimensional Integrated Circuits.
8: Improvement of Performance and Cost of Functional Films Using Large Area Laser RTP.
9: Pulsed Laser Dopant Activation for Semiconductors and Solar Cells.
10: Formation of High-Quality &#x03BC;m-Order-Thick Poly-Si Films on Glass-Substrates by Flash Lamp Annealing.
11: Millisecond-Range Liquid-Phase Processing of Silicon-Based Hetero-nanostructures.
12: Radiation Thermometry&#x2014;Sources of Uncertainty During Contactless Temperature Measurement.
13: Millisecond Annealing for Semiconductor Device Applications.
14: Low-Cost and Large-Area Electronics, Roll-to-Roll Processing and Beyond.
15: Application of Sub-second Annealing for Diluted Ferromagnetic Semiconductors.
Index.

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Subsecond Annealing of Advanced Materials