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Atomic Layer Deposition for Semiconductors

ATOMIC LAYER DEPOSITION FOR SEMICONDUCTORS

Physics

Mathematics & Science

Gt Product Group

Binding Format

Marketing Imprint Name

B2B GT

CL Carton Count

Imprint Name

B2B & B2C

This edited volume discusses atomic layer deposition (ALD) for all modern semiconductor devices, moving from the basic chemistry of ALD and modeling of ALD processes to sections on ALD for memories, logic devices, and machines. The section on ALD for memories covers both mass-produced memories, such as DRAM and Flash, and emerging memories, such as PCRAM and FeRAM. The section on ALD for logic devices covers both front-end of the line processes and back-end of the line processes. The final section on ALD for machines looks at toolsets and systems hardware. Each chapter provides the history, operating principles, and a full explanation of ALD processes for each device.

POST SECONDARY FOUR YEAR

COLFR

COLJR

COLSO

COLSR

Duration

Duration Unit Of Measure

Transaction Type

Front Cover.
Half Title Page.
Title Page.
Copyright Page.
Foreword.
Preface.
Contents.
1: Introduction.
2: Introduction.
3: Fundamentals.
4: ALD Precursors and Reaction Mechanisms.
5: ALD Simulations.
6: ALD for Memory Devices.
7: Mass-Production Memories (DRAM and Flash).
8: PCRAM.
9: FeRAM.
10: ALD for Logic Devices.
11: Front End of the Line Process.
12: Back End of the Line.
13: ALD Machines.
14: ALD Machines.
15: Erratum to: Atomic Layer Deposition for Semiconductors.
Index.

Atomic Layer Deposition for Semiconductors.css-1p8rvzy{position:absolute;padding-left:8px;}

Atomic Layer Deposition for Semiconductors